Thickness determination of thin and ultra-thin SiO 2 films by C-AFM IV-spectroscopy
(2006)
Journal Article
Frammelsberger, W., Benstetter, G., Kiely, J., & Stamp, R. (2006). Thickness determination of thin and ultra-thin SiO 2 films by C-AFM IV-spectroscopy. Applied Surface Science, 252(6), 2375-2388. https://doi.org/10.1016/j.apsusc.2005.04.010
Conductive atomic force microscopy was used to determine the electrical oxide thickness for five different silicon dioxide layers with thickness in the order of 1.6-5.04 nm. The electrical thickness results were compared with values determined by ell... Read More about Thickness determination of thin and ultra-thin SiO 2 films by C-AFM IV-spectroscopy.